High resolution photoemission study of interface formation between MgO and the selenium passivated InAs (100) surface
Identifieur interne : 000C03 ( Main/Repository ); précédent : 000C02; suivant : 000C04High resolution photoemission study of interface formation between MgO and the selenium passivated InAs (100) surface
Auteurs : RBID : Pascal:14-0026756Descripteurs français
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- concept : Composé minéral.
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Abstract
Interface formation between an ultra thin MgO layer and the selenium passivated InAs surface has been investigated by soft X-ray photoemission spectroscopy. Atomic hydrogen cleaning of the native oxide covered InAs at 360 °C produced an oxide and carbon free InAs surface. The selenium passivation of the atomically clean InAs showed evidence of arsenic replacement in the near surface region. Subsequent MgO deposition resulted in the appearance of an oxidized indium signal indicating that the bonding interaction between the MgO and the substrate is via indium-oxide bond formation. The conduction and valence band offsets were also estimated for this dielectric-semiconductor structure.
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">High resolution photoemission study of interface formation between MgO and the selenium passivated InAs (100) surface</title>
<author><name>RAJESH KUMAR CHELLAPPAN</name>
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<s2>Dublin</s2>
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<country>Irlande (pays)</country>
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<author><name>ZHESHEN LI</name>
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<author><name sortKey="Hughes, Greg" uniqKey="Hughes G">Greg Hughes</name>
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<title level="j" type="abbreviated">Appl. surf. sci.</title>
<title level="j" type="main">Applied surface science</title>
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Core levels</term>
<term>Indium arsenides</term>
<term>Inorganic compounds</term>
<term>Magnesium oxide</term>
<term>Passivation</term>
<term>Photoemission</term>
<term>Selenium</term>
<term>Semiconductor materials</term>
<term>Surface cleaning</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Photoémission</term>
<term>Sélénium</term>
<term>Niveau coeur</term>
<term>Nettoyage surface</term>
<term>Passivation</term>
<term>Oxyde de magnésium</term>
<term>Arséniure d'indium</term>
<term>Semiconducteur</term>
<term>Mg O</term>
<term>MgO</term>
<term>Se</term>
<term>As In</term>
<term>InAs</term>
<term>Composé minéral</term>
</keywords>
<keywords scheme="Wicri" type="concept" xml:lang="fr"><term>Composé minéral</term>
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<front><div type="abstract" xml:lang="en">Interface formation between an ultra thin MgO layer and the selenium passivated InAs surface has been investigated by soft X-ray photoemission spectroscopy. Atomic hydrogen cleaning of the native oxide covered InAs at 360 °C produced an oxide and carbon free InAs surface. The selenium passivation of the atomically clean InAs showed evidence of arsenic replacement in the near surface region. Subsequent MgO deposition resulted in the appearance of an oxidized indium signal indicating that the bonding interaction between the MgO and the substrate is via indium-oxide bond formation. The conduction and valence band offsets were also estimated for this dielectric-semiconductor structure.</div>
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<fA11 i1="01" i2="1"><s1>RAJESH KUMAR CHELLAPPAN</s1>
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<sZ>3 aut.</sZ>
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<fA14 i1="02"><s1>ISA, Institute of Physics and Astronomy, Aarhus University</s1>
<s2>8000 Aarhus</s2>
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<fC01 i1="01" l="ENG"><s0>Interface formation between an ultra thin MgO layer and the selenium passivated InAs surface has been investigated by soft X-ray photoemission spectroscopy. Atomic hydrogen cleaning of the native oxide covered InAs at 360 °C produced an oxide and carbon free InAs surface. The selenium passivation of the atomically clean InAs showed evidence of arsenic replacement in the near surface region. Subsequent MgO deposition resulted in the appearance of an oxidized indium signal indicating that the bonding interaction between the MgO and the substrate is via indium-oxide bond formation. The conduction and valence band offsets were also estimated for this dielectric-semiconductor structure.</s0>
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<fC03 i1="01" i2="3" l="FRE"><s0>Photoémission</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG"><s0>Photoemission</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Sélénium</s0>
<s2>NC</s2>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>Selenium</s0>
<s2>NC</s2>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>Niveau coeur</s0>
<s5>03</s5>
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<fC03 i1="03" i2="3" l="ENG"><s0>Core levels</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Nettoyage surface</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Surface cleaning</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Passivation</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Passivation</s0>
<s5>05</s5>
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<fC03 i1="06" i2="X" l="FRE"><s0>Oxyde de magnésium</s0>
<s5>15</s5>
</fC03>
<fC03 i1="06" i2="X" l="ENG"><s0>Magnesium oxide</s0>
<s5>15</s5>
</fC03>
<fC03 i1="06" i2="X" l="SPA"><s0>Magnesio óxido</s0>
<s5>15</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>Arséniure d'indium</s0>
<s2>NK</s2>
<s5>16</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG"><s0>Indium arsenides</s0>
<s2>NK</s2>
<s5>16</s5>
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<fC03 i1="08" i2="3" l="FRE"><s0>Semiconducteur</s0>
<s5>17</s5>
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<fC03 i1="08" i2="3" l="ENG"><s0>Semiconductor materials</s0>
<s5>17</s5>
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<fC03 i1="09" i2="3" l="FRE"><s0>Mg O</s0>
<s4>INC</s4>
<s5>32</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE"><s0>MgO</s0>
<s4>INC</s4>
<s5>33</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE"><s0>Se</s0>
<s4>INC</s4>
<s5>34</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE"><s0>As In</s0>
<s4>INC</s4>
<s5>35</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE"><s0>InAs</s0>
<s4>INC</s4>
<s5>36</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE"><s0>Composé minéral</s0>
<s5>62</s5>
</fC03>
<fC03 i1="14" i2="3" l="ENG"><s0>Inorganic compounds</s0>
<s5>62</s5>
</fC03>
<fN21><s1>027</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
</fN44>
<fN82><s1>OTO</s1>
</fN82>
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